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Semiconductor Research Corporation

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SRC and Stanford University Prove New Circuit Pattern-Design Process, See Promise For 14 Nanometer Design With Directed Self-Assembly

2012-05-26

RESEARCH TRIANGLE PARK, N.C. ---- Researchers sponsored by Semiconductor Research Corporation (SRC), the world's leading university-research consortium for semiconductors and related technologies, today announced that they have successfully created contact hole patterns for a wide variety of practical logic and memory devices using a next-generation directed self-assembly (DSA) process. Applying a relatively simple combination of chemical and thermal processes to create their DSA method for making circuits ......

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